Van der Waals Force Isolation of Monolayer MoS2

被引：44

作者：

Gurarslan, Alper ^{[1
,2
]}

Jiao, Shuping ^{[3
]}

Li, Tai-De ^{[4
,6
]}

Li, Guoqing ^{[1
,2
]}

Yu, Yiling ^{[5
]}

Gao, Yang ^{[4
,6
]}

Riedo, Elisa ^{[4
,6
,7
,8
]}

Xu, Zhiping ^{[3
]}

Cao, Linyou ^{[1
,5
]}

机构：

[1] North Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA

[2] North Carolina State Univ, Dept Fiber & Polymer Sci, Raleigh, NC 27695 USA

[3] Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China

[4] CUNY, Adv Sci Res Ctr, New York, NY 10031 USA

[5] North Carolina State Univ, Dept Phys, Raleigh, NC 27695 USA

[6] Georgia Inst Technol, Sch Phys, Atlanta, GA 30332 USA

[7] CUNY City Coll, Dept Phys, New York, NY 10031 USA

[8] CUNY, Grad Ctr, New York, NY 10016 USA

来源：

ADVANCED MATERIALS | 2016年 / 28卷 / 45期

基金：

美国国家科学基金会;

关键词：

HYDROGEN EVOLUTION; WETTABILITY; GRAPHENE; FILMS; LAYER; WATER; MONO;

D O I：

10.1002/adma.201601581

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Monolayer MoS2 can effectively screen the vdW interaction of underlying substrates with external systems by >90% because of the substantial increase in the separation between the substrate and external systems due to the presence of the monolayer. This substantial screening of vdW interactions by MoS2 monolayer is different from what reported at graphene.

引用

页码：10055 / 10060

页数：6

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