Modulating metallic conductive filaments via bilayer oxides in resistive switching memory

被引:52
作者
Sun, Y. M. [1 ]
Song, C. [1 ]
Yin, J. [1 ]
Qiao, L. L. [1 ]
Wang, R. [1 ]
Wang, Z. Y. [1 ]
Chen, X. Z. [1 ]
Yin, S. Q. [1 ]
Saleem, M. S. [1 ]
Wu, H. Q. [2 ]
Zeng, F. [1 ]
Pan, F. [1 ]
机构
[1] Tsinghua Univ, Sch Mat Sci & Engn, Lab Adv Mat MOE, Beijing 100084, Peoples R China
[2] Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
基金
中国国家自然科学基金; 国家重点研发计划;
关键词
THIN-FILMS; DEVICES; GROWTH;
D O I
10.1063/1.5098382
中图分类号
O59 [应用物理学];
学科分类号
摘要
Large fluctuations of key parameters in cation-based resistive random access memory (RRAM), which originate from stochastic growth of metallic conductive filaments, always impose a significant barrier to the practical application of memory devices. Here, we propose an ordinary bilayer oxide structure of Ag/TaOx/TaOy/Pt (x<y) to address this issue and achieve the performance enhancement of memory cells. This memory device is inclined to form nano-cone-shaped filaments under external bias, and the tips of filaments provide an electric field concentration, achieving an effective control of filament growth. Compared with the single-layer device Ag/TaOx/Pt, the bilayer device manifests a larger ON/OFF ratio, much lower operation voltages and RESET currents, a higher response speed, and better uniformity. The insertion of the oxygen-rich layer also brings about the tunability of switching voltages and the elimination of the negative-SET phenomenon. Our experiments might pave the way for high-density emerging memory commercial applications.
引用
收藏
页数:5
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