Lasing at 1065 nm in bulk Nd3+-doped telluride-tungstate glass

被引：56

作者：

Kalaycioglu, Hamit ^{[1
]}

Cankaya, Huseyin ^{[1
]}

Ozen, Gonul ^{[2
]}

Ovecoglu, Lutfu ^{[3
]}

Sennaroglu, Alphan ^{[1
]}

机构：

[1] Koc Univ, Dept Phys, Laser Res Lab, TR-34450 Istanbul, Turkey

[2] Istanbul Tech Univ, Dept Phys, TR-34469 Istanbul, Turkey

[3] Istanbul Tech Univ, Dept Chem & Met Engn, TR-34469 Istanbul, Turkey

来源：

OPTICS COMMUNICATIONS | 2008年 / 281卷 / 24期

关键词：

D O I：

10.1016/j.optcom.2008.08.053

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have achieved, for the first time to our knowledge, lasing in a new type of telluride-tungstate glass host doped with neodymium: Nd3+:(0.8)TeO2-(0.2)WO3. Lasing was obtained at 1065 nm with two samples containing 0.5 mol% and 1.0 mol% Nd2O3. During gain-switched operation, slope efficiencies of 12% and 10% were obtained with the 0.5 mol% and 1.0 mol% doped samples, respectively, at a pulse repetition rate of I kHz. Judd-Ofelt analysis was further employed to determine the emission cross section sigma(e) at 1065 nm from the absorption spectra and lifetime data. The emission cross section from the Judd-Ofelt analysis came to 3.23 +/- 0.09 x 10(-20) cm(2), in reasonable agreement with the value of 2.0 +/- 0.13 x 10(-20) cm(2) obtained from the analysis of laser threshold data. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：6056 / 6060

页数：5

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