Titanium-doped Indium Oxide Films Prepared by RF Magnetron Sputtering

被引:0
|
作者
Han, D. W. [1 ]
Darma, J. [1 ]
Kuantama, E. [1 ]
Kwak, D. J. [1 ]
Sung, Y. M. [1 ]
机构
[1] Kyungsung Univ, Pusan 608736, South Korea
关键词
titanium-doped indium oxide; transparent conducting oxide; rf magnetron sputtering; dye-sensitized solar cell;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Transparent conductive titanium-doped indium oxide (ITiO) films were prepared on soda-lime glass substrate using an rf magnetron sputter source. The electrical and optical properties of the transparent conductive ITiO film and the photovoltaic performance of the prepared DSCs were examined. The ITiO thin films containing 5 wt.% Ti showed the minimum resistivity of rho=5.25x10(-3) Omega-cm. The optical transmittance increases from 70% at 450 nm to 80% at 700 nm in visible spectrum. In addition, XPS and AFM measurements were performed to investigate the surface structural properties of the films. Finally, the ITiO film used for TCO layer of dye-sensitized solar cells (DSCs) exhibited an energy conversion efficiency of about 3.73% at light intensity of 100 mW/cm(2). It can be therefore seen that the ITiO films obtained by rf magnetron sputter system exhibited good transparent conductive properties, well suited for DSCs application.
引用
收藏
页码:599 / 602
页数:4
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