Thickness and density measurement for new materials with combined X-ray technique

被引：13

作者：

Terada, S ^{[1
]}

Murakami, H ^{[1
]}

Nishihagi, K ^{[1
]}

机构：

[1] TECHNOS Co Ltd, Hirakata, Osaka, Japan

来源：

2001 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE | 2001年

关键词：

X-ray; XRR; XRF; XRD; thickness; density; composition; crystal orientation; copper low-k; PZT;

D O I：

10.1109/ASMC.2001.925630

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An X-ray metrology tool that has functions of X-ray Reflectometry (XRR), X-ray Fluorescence (XRF) and X-ray Diffraction (XRD) has been developed. Thickness of a film can be determined using XRR, XRF or XRD. The way of choosing a method is discussed. Density is determined using XRR, Composition is determined using XRF. Crystal orientation is determined using XRD. Combined tools are developed to give maximum speed for major applications.

引用

页码：125 / 130

页数：6