Thin film deposition by laser ablation

被引：0

作者：

Duley, WW

机构：

来源：

LASER PROCESSING: SURFACE TREATMENT AND FILM DEPOSITION | 1996年 / 307卷

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D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Most refractory materials can be deposited in thin film form by laser sputtering or ablation of precursor solids. Ablation of solids using UV excimer laser radiation can yield high deposition rates, deposition of monolayers and stoichiometric deposits. This paper summarizes available data on the deposition of a variety of non metallic solids using laser ablation. Mechanisms involved in the deposition of diamond-like carbon films are discussed as a special case.

引用

页码：739 / 750

页数：12

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