Impact of lattice defects on the performance degradation of Si photodiodes by high-temperature gamma and electron irradiation

被引:31
|
作者
Ohyama, H
Hirao, T
Simoen, E
Claeys, C
Onoda, S
Takami, Y
Itoh, H
机构
[1] Kumamoto Natl Coll Technol, Dept Elect Engn, Kumamoto 8601102, Japan
[2] Takasaki JAERI, Gunma 3701292, Japan
[3] Katholieke Univ Leuven, EE Dept, B-3001 Louvain, Belgium
[4] IMEC, B-3001 Louvain, Belgium
[5] Tokai Univ, Kanagawa 2591292, Japan
[6] Rikkyo Univ, Yokohama, Kanagawa 2400101, Japan
关键词
Si photodiode; radiation damage; high-temperature irradiation; gamma-irradiation; electron irradiation; induced deep levels;
D O I
10.1016/S0921-4526(01)00949-8
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Results of a detailed study of the effects of high-temperature gamma-ray and electron irradiation on the performance degradation of Si pin photodiodes are presented. The macroscopic device performance will be correlated with the radiation-induced defects, observed by DLTS. After irradiation, two majority electron capture levels with (E-c-0.22 eV) and (E-c - 0.40 eV) were induced in the n-Si substrate, while one minority hole capture level with (E-v + 0.37 eV) was found. It was found that the dark current increases after irradiation, while the photo current decreases. Additionally, the degradation of the device performance and the introduction rate of the lattice defects decrease with increasing irradiation temperature. At 200degreesC irradiation, the reduction of the photocurrent is only 10% of the starting value. This result suggests that the creation and recovery of the radiation damage proceeds simultaneously at high temperatures. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1226 / 1229
页数:4
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