The effect of deposition temperature on the growth of TiC whiskers by the vapor-liquid-solid mechanism

被引:12
作者
Chen, YH [1 ]
Pan, JS [1 ]
Huang, XY [1 ]
机构
[1] TSING HUA UNIV,DEPT MAT SCI & ENGN,BEIJING 100084,PEOPLES R CHINA
关键词
D O I
10.1016/S0022-0248(96)00714-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
An experimental study was made of the effect of deposition temperature on the growth of TiC whiskers prepared by the CVD process. The TiC whiskers were obtained with high yield in the rather low temperature range from 1220 to 1370 K, using a TiCl4-CH4-H-2-Ar gas mixture and a pure nickel substrate. An examination of the morphology of the TiC whiskers was made and the VLS growth mechanism was verified experimentally. The effect of deposition temperature on the growth of TiC whiskers is discussed and explained according to the VLS mechanism, and the appropriate temperature range for the growth of TiC whiskers using nickel substrates was found.
引用
收藏
页码:171 / 174
页数:4
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