Design and analysis of a dual gate tunnel FET with InGaAs source pockets for

被引:11
作者
Rasheed, Gadarapulla [1 ]
Sridevi, Sriadibhatla [1 ]
机构
[1] Vellore Inst Technol, Sch Elect Engn, Vellore 632014, Tamil Nadu, India
来源
MICROELECTRONICS JOURNAL | 2022年 / 129卷
关键词
Subthreshold swing (SS); Tunnel field-effect transistor (TFET); Double pocket; Band-to-band tunneling; III-V materials; Figures of merit (FOMs); FIELD-EFFECT TRANSISTORS; LOW-POWER; VOLTAGE; ANALOG; MOSFET;
D O I
10.1016/j.mejo.2022.105587
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we propose a novel dual gate tunnel FET (TFET) with an improved ON current. The source pockets of the proposed TFET are designed with a narrow bandgap InGaAs material. As a result, the tunnel width is minimized and a large number of charge carriers will tunnel via the source-channel junction. The DC parameters, as well as RF figures of merit, are analyzed for the proposed TFET. The results have shown that the proposed TFET exhibits a 3.8x increment in ON current, a 51.75% decrement in threshold voltage, and a 50.67% reduction in the subthreshold swing as compared to the existing device. The proposed device has reported a transconductance of 15.4 mS/mu m, an output conductance of 8.4 mS/mu m, a cut-off frequency of 22.35 THz, and a gain-bandwidth-product of 5.11 THz at a supply voltage of 1 V. Further, temperature stability analysis is carried out to study its impact on DC parameters of the proposed TFET.
引用
收藏
页数:9
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