Linear variable optical filter-based ultraviolet microspectrometer

被引:33
作者
Emadi, Arvin [1 ]
Wu, Huaiwen [1 ]
de Graaf, Ger [1 ]
Enoksson, Peter [2 ]
Correia, Jose Higino [3 ]
Wolffenbuttel, Reinoud [1 ]
机构
[1] Delft Univ Technol, Fac Elect Engn Math & Comp Sci, Dept Microelect Elect Instrumentat, NL-2628 CD Delft, Netherlands
[2] MC2 Chalmers Univ Technol, BioNano Syst Lab, SE-41296 Gothenburg, Sweden
[3] Univ Minho, Dept Ind Elect, P-4800 Guimaraes, Portugal
关键词
SPECTROSCOPY; RESOLUTION; ROUGHNESS; CHIP;
D O I
10.1364/AO.51.004308
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
An IC-compatible linear variable optical filter (LVOF) for application in the UV spectral range between 310 and 400 nm has been fabricated using resist reflow and an optimized dry-etching. The LVOF is mounted on the top of a commercially available CMOS camera to result in a UV microspectrometer. A special calibration technique has been employed that is based on an initial spectral measurement on a xenon lamp. The image recorded on the camera during calibration is used in a signal processing algorithm to reconstruct the spectrum of the mercury lamp and the calibration data is subsequently used in UV spectral measurements. Experiments on a fabricated LVOF-based microspectrometer with this calibration approach implemented reveal a spectral resolution of 0.5 nm. (C) 2012 Optical Society of America
引用
收藏
页码:4308 / 4315
页数:8
相关论文
共 23 条
[1]  
[Anonymous], 2000, Principles of optics: electromagnetic theory of propagation, interference and diffraction of light
[2]   PHASE RETARDANCE OF PERIODIC MULTILAYER MIRRORS [J].
APFEL, JH .
APPLIED OPTICS, 1982, 21 (04) :733-738
[3]   ANALYTIC EXPRESSIONS FOR THE REFLECTION DELAY, PENETRATION DEPTH, AND ABSORPTANCE OF QUARTER-WAVE DIELECTRIC MIRRORS [J].
BABIC, DI ;
CORZINE, SW .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1992, 28 (02) :514-524
[4]  
BLANCO JR, 1985, APPL OPTICS, V24, P3773, DOI 10.1364/AO.24.003773
[5]  
Chen FZ, 1999, PLANET SPACE SCI, V47, P261, DOI 10.1016/S0032-0633(98)00074-9
[6]  
Collins R., 2005, Handbook of Ellipsometry, DOI DOI 10.1007/3-540-27488-X
[7]  
CORREIA J H, 2007, ECS T, V4, P141
[8]   Vertically tapered layers for optical applications fabricated using resist reflow [J].
Emadi, A. ;
Wu, H. ;
Grabarnik, S. ;
de Graaf, G. ;
Wolffenbuttel, R. F. .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2009, 19 (07)
[9]  
Emadi A., 2010, THESIS TU DELFT
[10]   Design and implementation of a sub-nm resolution microspectrometer based on a Linear-Variable Optical Filter [J].
Emadi, Arvin ;
Wu, Huaiwen ;
de Graaf, Ger ;
Wolffenbuttel, Reinoud .
OPTICS EXPRESS, 2012, 20 (01) :489-507