Macroparticle filtering of high-current vacuum arc plasmas

被引:42
作者
Schulke, T
Anders, A
Siemroth, P
机构
[1] FRAUNHOFER INST MAT PHYS & SURF ENGN,IWS,D-01277 DRESDEN,GERMANY
[2] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,BERKELEY,CA 94720
关键词
carbon films; deposition; filtering; hard coatings; high-current; microparticle; plasma; vacuum arc;
D O I
10.1109/27.640681
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The transport of vacuum are plasmas through a 90 degrees curved magnetic macroparticle filter was investigated using a high-current pulsed are source with a carbon cathode, The peak are current was in the kiloampiere range, exceeding considerably the level of what has been reported in the literature, The main question investigated was whether magnetic macroparticle filters could be scaled up while maintaining the transport efficiency of small filters, In front of the cathode, we found that are current dependent total ion saturation currents were-in the range from 10% to 23% of the are current, The best relative transmission was 25% (time integrated output/time integrated input) at a duct wall bias of 12.5 V and at an axial magnetic field of about 100 mT, The measured relative transmission of the used high-current arrangement is comparable to what has been observed with other low-current filters, Tbe absolute measurable ion saturation currents at the filter exit reached 70 A at an are current of about 1000 A.
引用
收藏
页码:660 / 664
页数:5
相关论文
共 12 条
[1]   EFFECT OF DUCT BIAS ON TRANSPORT OF VACUUM-ARC PLASMAS THROUGH CURVED MAGNETIC FILTERS [J].
ANDERS, A ;
ANDERS, S ;
BROWN, IG .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (10) :4900-4905
[2]   ON THE MACROPARTICLE FLUX FROM VACUUM-ARC CATHODE SPOTS [J].
ANDERS, S ;
ANDERS, A ;
YU, KM ;
YAO, XY ;
BROWN, IG .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1993, 21 (05) :440-446
[3]   FOCUSED INJECTION OF VACUUM-ARC PLASMAS INTO CURVED MAGNETIC FILTERS [J].
ANDERS, S ;
ANDERS, A ;
BROWN, I .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (10) :4895-4899
[4]   MACROPARTICLE-FREE THIN-FILMS PRODUCED BY AN EFFICIENT VACUUM-ARC DEPOSITION TECHNIQUE [J].
ANDERS, S ;
ANDERS, A ;
BROWN, I .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) :4239-4241
[5]   Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc [J].
Bilek, MMM ;
Chhowalla, M ;
Weiler, M ;
Milne, WI .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (03) :1287-1291
[6]   Filtered vacuum arc deposition of semiconductor thin films [J].
Boxman, RL ;
Goldsmith, S ;
BenShalom, A ;
Kaplan, L ;
Arbilly, D ;
Gidalevich, E ;
Zhitomirsky, V ;
Ishaya, A ;
Keidar, M ;
Beilis, II .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1995, 23 (06) :939-944
[7]   FUNDAMENTAL-STUDIES OF THE STEERED ARC TECHNIQUE [J].
IVES, M ;
BROOKS, JS ;
CAWLEY, J ;
BURGMER, W .
SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3) :244-252
[8]   VACUUM ARC ION CURRENTS AND ELECTRODE PHENOMENA [J].
KIMBLIN, CW .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (04) :546-+
[9]   CHARACTERIZATION OF THIN DIAMOND-LIKE CARBON-FILMS BY ULTRASONIC SURFACE-WAVES [J].
SCHNEIDER, D ;
SCHEIBE, HJ ;
SCHWARZ, T ;
HESS, P .
DIAMOND AND RELATED MATERIALS, 1993, 2 (11) :1396-1401
[10]  
SCHULKE T, 1995, MAGNETISCHE PLASMFIL