Influence of Alkali Ions on Tribological Properties of Silicon Surface

被引:6
作者
Jarzabek, Dariusz M. [1 ]
Siewert, Dorota [2 ]
Fabianowski, Wojciech [3 ]
Schift, Helmut [2 ]
Rymuza, Zygmunt [3 ]
Jung, Thomas [2 ]
机构
[1] Polish Acad Sci, Inst Fundamental Technol Res, PL-02390 Warsaw, Poland
[2] Paul Scherrer Inst, Villigen, Switzerland
[3] Warsaw Univ Technol, Warsaw, Poland
关键词
Silicon surface; Scanning force microscopy; Friction; Adhesion; Alkali metal chlorides; ATOMIC-FORCE MICROSCOPY; LIQUID-FILMS; MEMS; LUBRICATION; FRICTION; WATER; WEAR; IMPLANTATION; DISSIPATION; CALIBRATION;
D O I
10.1007/s11249-015-0603-5
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Tribological properties of surfaces (friction, adhesion and wear) provide challenging limitations to the design of reliable machines on the micro-and nanometer scale as the surface to volume area increases and volume, mass and inertia of the mobile parts decrease. This study reports on the reduction in the friction force of silicon surfaces after the alkali metal ion exposure in the form of aqueous solutions. A scanning force microscope equipped with a liquid cell was used to investigate the friction force and the pull-off force of a flat silicon surface immersed in water and in different alkali metal chlorides solutions: LiCl, NaCl and CsCl. The concentration ranged from 0.1 up to 1000 mu mol/l. The changes in the free surface energy of the initial surface and of the modified surfaces after drying were determined from contact angle measurements and from the acid-base adhesion theory. In both cases, in the liquid environment and after drying of the exposed silicon substrates in air, the friction force is reduced by approximately 50 %. Our results provide new, fundamental insight into the exchange of surface termination layers in particular for tribology. Also it is suggested to use the procedure as a low-cost alternative to improve the tribological properties of the silicon surface in particular in applications where lubricating fluids are not appropriate, e.g., in nanomachines and devices.
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页数:8
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共 35 条
  • [1] AFM-based nanotribological and electrical characterization of ultrathin wear-resistant ionic liquid films
    Bhushan, Bharat
    Palacio, Manuel
    Kinzig, Barbara
    [J]. JOURNAL OF COLLOID AND INTERFACE SCIENCE, 2008, 317 (01) : 275 - 287
  • [2] The lubrication of both aluminium-silicon and model silicon surfaces with calcium sulphonate and an organic antiwear additive
    Burkinshaw, Michael
    Neville, Anne
    Morina, Ardian
    Sutton, Mike
    [J]. TRIBOLOGY INTERNATIONAL, 2013, 67 : 211 - 216
  • [3] Water structuring and collagen adsorption at hydrophilic and hydrophobic silicon surfaces
    Cole, Daniel J.
    Payne, Mike C.
    Ciacchi, Lucio Colombi
    [J]. PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2009, 11 (48) : 11395 - 11399
  • [4] Mechanism of dopant segregation to SiO2/Si(001) interfaces
    Dabrowski, J
    Casali, RA
    Müssig, HJ
    Baierle, R
    Caldas, MJ
    Zavodinsky, V
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (04): : 2160 - 2164
  • [5] Tribology of MEMS
    de Boer, MP
    Mayer, TM
    [J]. MRS BULLETIN, 2001, 26 (04) : 302 - 304
  • [6] Mini and Micro Propulsion for Medical Swimmers
    Feng, Jian
    Cho, Sung Kwon
    [J]. MICROMACHINES, 2014, 5 (01) : 97 - 113
  • [7] ATTRACTIVE FORCES AT INTERFACES
    FOWKES, FM
    [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1964, 56 (12): : 40 - &
  • [8] The effect of nanoparticles on thin film elasto-hydrodynamic lubrication
    Ghaednia, Hamed
    Babaei, Hasan
    Jackson, Robert L.
    Bozack, Michael J.
    Khodadadi, J. M.
    [J]. APPLIED PHYSICS LETTERS, 2013, 103 (26)
  • [9] Nanotwinned diamond with unprecedented hardness and stability
    Huang, Quan
    Yu, Dongli
    Xu, Bo
    Hu, Wentao
    Ma, Yanming
    Wang, Yanbin
    Zhao, Zhisheng
    Wen, Bin
    He, Julong
    Liu, Zhongyuan
    Tian, Yongjun
    [J]. NATURE, 2014, 510 (7504) : 250 - +
  • [10] Cesium core level binding energy shifts at the O2/Cs/Si(113) surface
    Hwang, CC
    An, KS
    Park, RJ
    Kim, JS
    Lee, JB
    Park, CY
    Lee, SB
    Kimura, A
    Kakizaki, A
    [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1998, 88 : 733 - 739