Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target

被引:20
作者
Schriever, G [1 ]
Bergmann, K [1 ]
Lebert, R [1 ]
机构
[1] Rhein Westfal TH Aachen, Lehrstuhl Lasertech, D-52074 Aachen, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 05期
关键词
D O I
10.1116/1.590872
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article we show that laser-produced plasmas using a cryogenic xenon target are emitters of pulsed broadband extreme ultraviolet radiation with an intensity maximum around 11 nm. The photon flux and conversion efficiency (CE) of this source is comparable to the emission of laser-produced plasmas of solid state targets using elements with high atomic numbers. The CE of the laser-produced xenon plasma in a 2% wavelength band at the beryllium absorption K edge at 11.1 nm is about two times higher compared to the CE at the silicon absorption L edge at 12.4 nm. (C) 1999 American Vacuum Society.
引用
收藏
页码:2058 / 2060
页数:3
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