An Accurate Compact Model For Gallium Nitride Gate Injection Transistor For Next Generation of Power Electronics Design

被引:0
|
作者
Kotecha, Ramchandra M. [1 ]
Zhang, Yuzhi [1 ]
Wallace, Andrea [1 ]
Zhu, Nan [1 ]
Rashid, Arman [1 ]
Vrotsos, Tom [1 ]
Mantooth, H. Alan [1 ]
机构
[1] Univ Arkansas, NSF I UCRC Grid Connected Adv Power Elect Syst GR, Fayetteville, AR 72701 USA
来源
2017 IEEE 18TH WORKSHOP ON CONTROL AND MODELING FOR POWER ELECTRONICS (COMPEL) | 2017年
基金
美国国家科学基金会;
关键词
Gallium Nitride (GaN); Wide band-gap (WBG) devices; high electron mobility transistor (HEMT); compact modeling; power semiconductor devices; high-speed power electronics; high-efficiency power electronics; device modeling;
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
A physics-based analytical and compact device model for an enhancement-mode gallium nitride gate injection transistor is presented in this work. The model is implemented in Saber (R) using MAST hardware description language (HDL). The physics-based model allows the user to extract the model parameters from the dc I-V and C-V characteristics that are readily available in the device datasheets. The classical driftdiffusion model of carrier transport is used to describe the lateral channel current resulting from a very large concentration of carriers at the AlGaN/GaN hetero-junction. The dynamic validation of the model has been demonstrated against the measured characteristics of a 600 V commercial Panasonic GaN transistor using a double-pulse test circuit. The simulated vs. measured device characteristics show satisfactory agreement and validate the model for future power electronics applications and design.
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页数:6
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