A Crystalline Metallic Copper Network Application Film Produced by High-Temperature Atmospheric Sintering

被引:9
作者
Kato, Takahiko [1 ,2 ]
Adachi, Shuichiro [3 ]
Aoyagi, Takuya [1 ]
Naito, Takashi [1 ]
Yamamoto, Hiroki [1 ]
Nojiri, Takeshi [3 ]
Yoshida, Masato [3 ]
机构
[1] Hitachi Ltd, Hitachi Res Lab, Ibaraki 3191292, Japan
[2] Hokkaido Univ, Sapporo, Hokkaido 0608628, Japan
[3] Hitachi Chem Co Ltd, Tsukuba Res Lab, Tsukuba, Ibaraki 3004247, Japan
来源
IEEE JOURNAL OF PHOTOVOLTAICS | 2012年 / 2卷 / 04期
关键词
Atmospheric sintering; copper-phosphorus (Cu-P) alloy paste; crystalline metallic copper application film; crystalline silicon (Si) photovoltaic (PVs) contacts; SILICON; PASSIVATION;
D O I
10.1109/JPHOTOV.2012.2188018
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We show the first production of a copper (Cu) application film (AF) consisting of a novel network of crystalline metallic Cu embedded with copper-phosphorus-oxygen glasses (Cu-2(PO4) and Cu2P2O7) to provide new feedstock materials for crystalline silicon (Si) photovoltaics (PVs). The Cu crystal network was preferentially grown in AF, and thus, a Cu AF with low-electrical resistivity was formed in air at elevated temperatures of >= 450 degrees C by using a copper-phosphorus (Cu-P) alloy paste as a starting material for the sintering. The Cu-P alloy had the role that governed deoxidization of a cuprous oxide, which was formed on heating during the sintering, by virtue of a concurrent oxidation of the Cu phosphide at elevated temperatures. Our results may open the way to the widespread use of atmospherically sintered Cu AFs for mass-production of next-generation crystalline Si PVs.
引用
收藏
页码:499 / 505
页数:7
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