The pristine atomic structure of MoS2 monolayer protected from electron radiation damage by graphene

被引:141
|
作者
Algara-Siller, Gerardo [1 ]
Kurasch, Simon [1 ]
Sedighi, Mona [1 ]
Lehtinen, Ossi [1 ]
Kaiser, Ute [1 ]
机构
[1] Univ Ulm, Cent Facil Electron Microscopy, Grp Electron Microscopy Mat Sci, D-89069 Ulm, Germany
关键词
HIGH-RESOLUTION; INTERFACES; LAYERS; KV;
D O I
10.1063/1.4830036
中图分类号
O59 [应用物理学];
学科分类号
摘要
Materials can, in principle, be imaged at the level of individual atoms with aberration-corrected transmission electron microscopy. However, such resolution can be attained only with very high electron doses. Consequently, radiation damage is often the limiting factor when characterizing sensitive materials. Here, we demonstrate a simple and an effective method to increase the electron radiation tolerance of materials by using graphene as protective coating. This leads to an improvement of three orders of magnitude in the radiation tolerance of monolayer MoS2. Further on, we construct samples in different heterostructure configurations to separate the contributions of different radiation damage mechanisms. (C) 2013 AIP Publishing LLC.
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页数:5
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