Electrical properties of (001)- and (116)-oriented epitaxial SrBi2Ta2O9 thin films prepared by metalorganic chemical vapor deposition

被引:93
作者
Ishikawa, K [1 ]
Funakubo, H [1 ]
机构
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Innovat & Engn Mat, Midori Ku, Yokohama, Kanagawa 2268502, Japan
关键词
D O I
10.1063/1.124888
中图分类号
O59 [应用物理学];
学科分类号
摘要
(001)- and (116)-oriented epitaxial SrBi2Ta2O9 (SBT) thin films were deposited on (100)SrRuO(3)parallel to(100)SrTiO3 substrates at 750 degrees C and (110)SrRuO(3)parallel to(110)SrTiO3 substrates at 820 degrees C by metalorganic chemical vapor deposition, respectively. The remanent polarization and the coercive field of the 200-nm-thick (116)-oriented SBT films normal to the substrate were 11.4 mu C/cm(2) and 80 kV/cm, respectively. The dielectric constant of this film was 140 at 1 kHz. On the other hand, the 200-nm-thick (001)-oriented SrBi2Ta2O9 films normal to the substrate showed no ferroelectricity and the dielectric constant was 70 at 1 kHz. (C) 1999 American Institute of Physics. [S0003-6951(99)05339-5].
引用
收藏
页码:1970 / 1972
页数:3
相关论文
共 10 条
  • [1] FATIGUE-FREE FERROELECTRIC CAPACITORS WITH PLATINUM-ELECTRODES
    DEARAUJO, CAP
    CUCHIARO, JD
    MCMILLAN, LD
    SCOTT, MC
    SCOTT, JF
    [J]. NATURE, 1995, 374 (6523) : 627 - 629
  • [2] Preparation of SrBi2Ta2O9 thin films by metalorganic chemical vapor deposition from two new liquid organometallic sources
    Funakubo, H
    Nukaga, N
    Ishikawa, K
    Watanabe, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (2B): : L199 - L201
  • [3] FUNAKUBO H, IN PRESS FERROELECTR
  • [4] Metalorganic chemical vapor deposition of epitaxial SrBi2Ta2O9 thin films and their crystal structure
    Ishikawa, K
    Nukaga, N
    Funakubo, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (3A): : L258 - L260
  • [5] ISHIKAWA K, IN PRESS JPN J APPL
  • [6] Epitaxial growth of (001)-oriented and (110)-oriented SrBi2Ta2O9 thin films
    Lettieri, J
    Jia, Y
    Urbanik, M
    Weber, CI
    Maria, JP
    Schlom, DG
    Li, H
    Ramesh, R
    Uecker, R
    Reiche, P
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (20) : 2923 - 2925
  • [7] Nagahama T., 1999, Key Engineering Materials, V169-170, P139
  • [8] Nukaga N., 1999, Key Engineering Materials, V169-170, P145
  • [9] Okuda N., 1999, T MAT RES SOC JPN, V24, P51
  • [10] STRUCTURE REFINEMENT OF COMMENSURATELY MODULATED BISMUTH STRONTIUM TANTALATE, BI2SRTA2O9
    RAE, AD
    THOMPSON, JG
    WITHERS, RL
    [J]. ACTA CRYSTALLOGRAPHICA SECTION B-STRUCTURAL SCIENCE, 1992, 48 : 418 - 428