Effects of hot-carrier stress on the performance of CMOS low-noise amplifiers

被引:30
作者
Naseh, S [1 ]
Deen, AJ [1 ]
Chen, CH [1 ]
机构
[1] McMaster Univ, Dept Elect & Comp Engn, Hamilton, ON L8S 4K1, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
hot carriers; linearity; low-noise amplifier (LNA); matching; noise figure; RF CMOS; reliability;
D O I
10.1109/TDMR.2005.853502
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of direct current (dc) hot-carrier stress on the characteristics of NMOSFETs and a fully integrated low-noise amplifier (LNA) made of NMOSFETs in an 0.18-mu m complementary MOS (CMOS) technology are investigated. The increase in threshold voltage and decrease in mobility caused by hot carriers lead to a drop in the biasing current of the transistors. These effects lead to a decrease in the transconductance and an increase of the output conductance of the device. No measurable change in the parasitic gate-source and gate-drain capacitances in the devices under test were observed due to hot carriers. In the LNA, the important effects caused by hot carriers were a drop of the power gain and an increase of the noise figure. A slight increase in the input and output matching S-11 and S-22, respectively, after hot-carrier stress was observed. The linearity parameter IIP3 of the LNA improved after stress. This is believed to be due to the improvement of the linearity of the I-V characteristics of the transistors in the LNA at the particular operating point where the measurements were performed.
引用
收藏
页码:501 / 508
页数:8
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