Aligning carbon nanotubes, synthesized using the arc discharge technique, during and after synthesis
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作者:
Berkmans, A. Joseph
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Indian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, India
Berkmans, A. Joseph
[1
]
Ramakrishnan, S.
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Indian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, India
Ramakrishnan, S.
[1
]
Jain, Gaurav
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Indian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, India
Jain, Gaurav
[1
]
Haridoss, Prathap
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Indian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, India
Haridoss, Prathap
[1
]
机构:
[1] Indian Inst Technol, Dept Met & Mat Engn, Madras 600036, Tamil Nadu, India
Alignment of multi-walled carbon nanotubes (MWCNTs) is demonstrated using physical forces both during synthesis, as well as post-synthesis through the arc discharge technique. The arc discharge process results in relatively straight and defect free MWCNTs compared to other techniques such as chemical vapor deposition. A scraper enables alignment of these straight MWCNTs during synthesis. Additional tailoring of the direction of alignment is seen to be possible even at room temperature, using physical forces in the form of scratch marks on the soot. Using a hand operated roller, on the surface of the soot, also results in the alignment of MWCNTs along the rolling direction. Alignment of MWCNTs is confirmed using scanning electron microscopy and it results in distinct changes in X-ray diffraction and energy dispersive spectroscopy data. These results are significant from the perspective of obtaining aligned MWCNTs, in large quantities, in a relatively inexpensive manner. (C) 2012 Elsevier Ltd. All rights reserved.
机构:
Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R ChinaAcad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Cheng, HM
Li, F
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Li, F
Su, G
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Su, G
Pan, HY
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Pan, HY
He, LL
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
He, LL
Sun, X
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Sun, X
Dresselhaus, MS
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
机构:
Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R ChinaAcad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Cheng, HM
Li, F
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h-index: 0
机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Li, F
Su, G
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h-index: 0
机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Su, G
Pan, HY
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h-index: 0
机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Pan, HY
He, LL
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h-index: 0
机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
He, LL
Sun, X
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h-index: 0
机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China
Sun, X
Dresselhaus, MS
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机构:Acad Sinica, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110015, Peoples R China