A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

被引：45

作者：

Longrie, Delphine ^{[1
]}

Deduytsche, Davy ^{[1
]}

Haemers, Jo ^{[1
]}

Driesen, Kris ^{[2
]}

Detavernier, Christophe ^{[1
]}

机构：

[1] Univ Ghent, Dept Solid State Sci, COCOON, B-9000 Ghent, Belgium

[2] Umicore, B-2250 Olen, Belgium

来源：

SURFACE & COATINGS TECHNOLOGY | 2012年 / 213卷

基金：

欧洲研究理事会;

关键词：

Atomic layer deposition; Rotary reactor; Nanoparticles; FLUIDIZED-BED REACTOR; FINE PARTICLES; ZNO FILMS; NANOPARTICLES; CVD; QUANTITIES; ZRO2;

D O I：

10.1016/j.surfcoat.2012.10.045

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

To conformally coat large amounts of particles using atomic layer deposition (ALD), agitation of the particles and efficient reactant usage are necessary. A rotary reactor was developed to enable both thermal and plasma-enhanced ALD growth on agitated particles. The effectiveness of the rotary reactor design was demonstrated by depositing Al2O3, TiO2 and AlN by thermal and plasma-enhanced ALD on ZnO nanopowder, stainless steel micron sized powder, titanium granules and glass beads. In-situ optical emission spectroscopy (OES) and mass spectroscopy (MS) measurements were performed to monitor saturation of the ALD half reactions, while ex-situ X-ray fluorescence (XRF), X-ray photo-electron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDX) and transmission electron microscopy (TEM) were used to confirm the composition and conformality of the deposited films. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：183 / 191

页数：9

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