AlGaN;
ohmic contact;
GaN;
specific contact resistance;
two-dimensional hole gas;
D O I:
10.1143/JJAP.45.L86
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In this study, we report that the p-type GaN (p-GaN) capping layer grown on top of p-type AlGaN (p-AlGaN) and the fabrication of recessed channels are used to demonstrate a new type of nonalloyed ohmic contact. Because the p-GaN layer grown on p-AlGaN led to the formation of spontaneous polarization fields in p-GaN and the lower band bending of p-AlGaN resulting in the formation of a two-dimensional hole gas (2DHG). As a result, we deduce that holes can be easily injected into the p-AlGaN layer through recessed channels and a 2DHG channel, which results in nonalloyed ohmic formation.