Techniques for measuring aberrations in lenses used in photolithography with printed patterns

被引：38

作者：

Nomura, H

Sato, T

机构：

[1] The Microelectronics Engineering Laboratory, Toshiba Corporation, 235-8522, 8, Shinsugita-cho

来源：

APPLIED OPTICS | 1999年 / 38卷 / 13期

关键词：

D O I：

10.1364/AO.38.002800

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In optical lithography, it is a serious problem that aberrations in projection lenses reduce the imaging quality. Therefore techniques to measure the aberrations are required that will predict the adverse effects of aberrations on lithographic imagery and reduce them. We present a measurement method that uses a fine grating and its imaging condition to quantify coma, astigmatism, and spherical aberration. With this method, these aberrations can be described with simple expressions from the measured results. Application of this method revealed the coma of Zernike polynomials for our krypton fluoride (KrF) excimer-laser scanner. (C) 1999 Optical Society of America.

引用

页码：2800 / 2807

页数：8

共 13 条

[1]

[Anonymous], PRINCIPLES OPTICS

[2] Impact of lens aberrations on optical lithography [J].

Brunner, TA .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1997, 41 (1-2) :57-67

[3] The challenge of 1-gigabit DRAM development when using optical lithography [J].

Farrell, T ;

Nunes, R ;

Samuels, D ;

Thomas, A ;

Ferguson, R ;

Molless, A ;

Wong, A ;

Conley, W ;

Wheeler, D ;

Credendino, S ;

Naeem, M ;

Hoh, P ;

Lu, ZJ .

OPTICAL MICROLITHOGRAPHY X, 1997, 3051 :333-341

[4] Lithographic lens testing: Analysis of measured aerial images, interferometric data and photoresist measurements [J].

Flagello, DG ;

Geh, B .

OPTICAL MICROLITHOGRAPHY IX, 1996, 2726 :788-798

[5]

Grosso R. P., 1979, Proceedings of the Society of Photo-Optical Instrumentation Engineers, V192, P65

[6] Measurement of astigmatism in microlithography lenses [J].

Kirk, JP .

OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 :848-854

[7]

KIRK JP, 1991, P SOC PHOTO-OPT INS, V1463, P282, DOI 10.1117/12.44788

[8]

Malacara D., 1992, Optical Shop Testing

[9] Overlay error due to lens coma and asymmetric illumination dependence on pattern feature [J].

Nomura, H ;

Sato, T .

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XII, 1998, 3332 :199-210

[10] Effect of variable sigma aperture on lens distortion and its pattern size dependence [J].

Saito, T ;

Watanabe, H ;

Okuda, Y .

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X, 1996, 2725 :414-423

← 1 2 →