In situ degradation studies of two-dimensional WSe2-graphene heterostructures

被引:15
作者
Wang, B. [1 ,2 ]
Eichfield, S. M. [2 ,3 ]
Wang, D. [2 ,3 ]
Robinson, J. A. [2 ,3 ]
Haque, M. A. [1 ,2 ]
机构
[1] Penn State Univ, Mech & Nucl Engn, University Pk, PA 16802 USA
[2] Penn State Univ, Ctr Dimens & Layered Mat 2, University Pk, PA 16802 USA
[3] Penn State Univ, Mat Sci & Engn, University Pk, PA 16802 USA
关键词
LARGE-AREA SYNTHESIS; GRAPHENE; WSE2; ELECTRON; PASSIVATION; SCATTERING; SILICON; FILMS; MOS2;
D O I
10.1039/c5nr03357h
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Heterostructures of two-dimensional materials can be vulnerable to thermal degradation due to structural and interfacial defects as well as thermal expansion mismatch, yet a systematic study does not exist in the literature. In this study, we investigate the degradation of freestanding WSe2-graphene heterostructures due to heat and charge flow by performing in situ experiments inside a transmission electron microscope. Experimental results show that purely thermal loading requires higher temperatures (>850 degrees C), about 150 degrees C higher than that under combined electrical and thermal loading. In both cases, selenium is the first element to decompose and migration of silicon atoms from the test structure to the freestanding specimen initiates rapid degradation through the formation of tungsten disilicide and silicon carbide. The role of the current flow is to enhance the migration of silicon from the sample holder and to knock-out the selenium atoms. The findings of this study provide fundamental insights into the degradation of WSe(2-)graphene heterostructures and inspire their application in electronics for use in harsh environments.
引用
收藏
页码:14489 / 14495
页数:7
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