Theory of the growth mode for a thin metallic film on an insulating substrate

被引:43
作者
Fuks, D
Dorfman, S
Zhukovskii, YF
Kotomin, EA
Stoneham, AM
机构
[1] Ben Gurion Univ Negev, Dept Mech Engn, IL-84105 Beer Sheva, Israel
[2] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
[3] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA
[4] Latvian State Univ, Inst Solid State Phys, LV-1063 Riga, Latvia
[5] UCL, Dept Phys & Astron, Ctr Mat Sci, London WC1E 6BT, England
[6] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
关键词
ab initio quantum chemical methods and calculations; equilibrium thermodynamics and statistical mechanics; growth; coatings; magnesium oxides; silver;
D O I
10.1016/S0039-6028(01)01692-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have developed a novel theory predicting the growth mode of a thin metallic film on an insulating substrate. This combines ab initio electronic structure calculations for several ordered metal/insulator interfaces (varying both coverage and substrate lattice constant). with a thermodynamic approach based on microscopic calculations. We illustrate this approach for Ag film deposited on MgO(00 1) substrate. Ab initio calculations predict high mobility of adsorbed silver atoms on the perfect magnesia surface even at low temperatures, Our theoretical analysis clearly demonstrates that the growth of metallic islands is predominant at the initial stage of silver deposition, which agrees with the experimental data. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:24 / 40
页数:17
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