Molecular Beam Epitaxy of Phosphorus-Doped ZnS

被引:3
|
作者
Ichino, Kunio [1 ]
Yoshida, Hiroshi [1 ]
Kawai, Takashi [1 ]
Matsumoto, Hiroyuki [1 ]
Kobayashi, Hiroshi [2 ]
机构
[1] Tottori Univ, Dept Elect & Elect Engn, Tottori 680, Japan
[2] Tokushima Bunri Univ, Dept Nano Mat & Bio Engn, Tokushima, Japan
关键词
ZnS; ZnS:P; Phosphorus; Acceptor; Photoluminescence; MBE;
D O I
10.3938/jkps.53.2939
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have grown phosphorus-acceptor-doped ZnS by molecular beam epitaxy. Two sources of phosphorus (P), i.e., GaP and Zn3P2, were used and compared. The ZnS:P epitaxial layers grown using GaP exhibited acceptor-related emission in the low-temperature photoluminescence spectra while the layers grown using Zn3P2 did not show distinct acceptor-related emission. Secondary ion mass spectroscopy revealed, however, that the phosphorus concentration was much higher in the ZnS:P layers grown using Zn3P2. These different behaviors between the two P sources seem to originate from the difference in the molecular species.
引用
收藏
页码:2939 / 2942
页数:4
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