Molecular Beam Epitaxy of Phosphorus-Doped ZnS

被引:3
|
作者
Ichino, Kunio [1 ]
Yoshida, Hiroshi [1 ]
Kawai, Takashi [1 ]
Matsumoto, Hiroyuki [1 ]
Kobayashi, Hiroshi [2 ]
机构
[1] Tottori Univ, Dept Elect & Elect Engn, Tottori 680, Japan
[2] Tokushima Bunri Univ, Dept Nano Mat & Bio Engn, Tokushima, Japan
关键词
ZnS; ZnS:P; Phosphorus; Acceptor; Photoluminescence; MBE;
D O I
10.3938/jkps.53.2939
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have grown phosphorus-acceptor-doped ZnS by molecular beam epitaxy. Two sources of phosphorus (P), i.e., GaP and Zn3P2, were used and compared. The ZnS:P epitaxial layers grown using GaP exhibited acceptor-related emission in the low-temperature photoluminescence spectra while the layers grown using Zn3P2 did not show distinct acceptor-related emission. Secondary ion mass spectroscopy revealed, however, that the phosphorus concentration was much higher in the ZnS:P layers grown using Zn3P2. These different behaviors between the two P sources seem to originate from the difference in the molecular species.
引用
收藏
页码:2939 / 2942
页数:4
相关论文
共 50 条
  • [21] Chlorine doping of cubic CdS and ZnS grown by compound source molecular-beam epitaxy
    Grün, M
    Storzum, A
    Hetterich, M
    Kamilli, A
    Send, W
    Walter, T
    Klingshirn, C
    JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 457 - 460
  • [22] Selective growth conditions of ZnSe/ZnS heterostructures on (001) GaAs with metalorganic molecular beam epitaxy
    Ueta, A
    Suemune, I
    Uesugi, K
    Arita, M
    Avramescu, A
    Numai, T
    Machida, H
    Shimoyama, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (08): : 5044 - 5049
  • [23] Γ-X mixing in phosphorus-doped silicon nanocrystals: Improvement of photon generation efficiency
    Belyakov, Vladimir A.
    Burdov, Vladimir A.
    PHYSICAL REVIEW B, 2009, 79 (03):
  • [24] Photoluminescence and photoacoustic spectra of N-doped ZnSe epitaxial layers grown by molecular beam epitaxy
    Yoshino, K
    Yoneta, M
    Saito, H
    Ohishi, M
    Chan, LH
    Abe, T
    Ando, K
    Ikari, T
    JOURNAL OF CRYSTAL GROWTH, 2000, 214 : 572 - 575
  • [25] Characterization of silicon-doped InP grown by solid-source molecular beam epitaxy using a valved phosphorus cracker cell
    Radhakrishnan, K
    Zheng, HQ
    Zhang, PH
    Yoon, SF
    Ng, GI
    JOURNAL OF CRYSTAL GROWTH, 1999, 204 (03) : 275 - 281
  • [26] Improved phosphorus doping in ZnTe by molecular beam epitaxy under alternating source supply
    Mustofa, Muhamad
    Saito, Katsuhiko
    Guo, Qixin
    Tanaka, Tooru
    JOURNAL OF APPLIED PHYSICS, 2023, 134 (19)
  • [27] NITROGEN-DOPED ZNSE AND ZNSSE GROWN BY MOLECULAR-BEAM EPITAXY
    MATSUMURA, N
    TSUBOKURA, M
    NAKAMURA, N
    MIYAGAWA, K
    MIYANAGI, Y
    SARAIE, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1990, 29 (02): : L221 - L224
  • [28] Molecular beam epitaxy growth of neodymium-doped yttrium aluminum perovskite
    Kumaran, R.
    Webster, S. E.
    Penson, S.
    Li, Wei
    Tiedje, T.
    JOURNAL OF CRYSTAL GROWTH, 2009, 311 (07) : 2191 - 2194
  • [29] Molecular beam epitaxy growth and characterisation of (AlGa)InP using GaP as a phosphorus source
    Najda, SP
    Kean, AH
    JOURNAL OF CRYSTAL GROWTH, 2000, 217 (04) : 345 - 348
  • [30] Optimisation of InP growth by molecular beam epitaxy using a valve Phosphorus cracker cell
    Yoon, SF
    Zheng, HQ
    JOURNAL OF ALLOYS AND COMPOUNDS, 1998, 269 (1-2) : 241 - 245