A Simulation Study of Thickness Effect in Performance of Double Lateral Gate Junctionless Transistors

被引:0
|
作者
Larki, Farhad [1 ]
Dehzangi, Arash [1 ]
Hamidon, M. N. [2 ]
Ali, Sawal Hamid Md [1 ]
Jalar, Azman [1 ]
Islam, Md. Shabiul [1 ]
机构
[1] Univ Kebangsaan Malaysia, Inst Microengn & Nanoelect IMEN, Bangi 43600, Selangor, Malaysia
[2] Univ Putra Malaysia, Inst Adv Technol, Funct Devices Lav, Serdang 43400, Malaysia
来源
2013 IEEE REGIONAL SYMPOSIUM ON MICRO AND NANOELECTRONICS (RSM 2013) | 2013年
关键词
Junctionless transistor; lateral gate; thickness effect; TCAD simulation; SILICON;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical behaviour of double lateral gate junctionless transistors, regarding to the variation of channel thickness is investigated, through 3-D numerical simulations. The simulation results explicitly show that how the device thickness affect the on and off current and threshold voltage behavior based on variation of the carriers density and recombination rates of the carriers. As the channel thickness is decreased, the amount of bulk neutral channel getting smaller which cause a decrease in the on state current. Meanwhile, the lateral gate influence on the channel is reinforced, which cause a decrease in leakage current in the off state. Threshold voltage is decreased as the channel thickness decreases. However, the recombination rate of carriers increases with decreasing the channel thickness, due to the accumulation of minority carries and shifted to the source side of the channel.
引用
收藏
页码:89 / 92
页数:4
相关论文
共 50 条
  • [31] Simulation of One-Transistor Dynamic Random-Access Memory Based on Symmetric Double-Gate Si Junctionless Transistor
    Kim, Bo Gyeong
    Seo, Jae Hwa
    Yoon, Young Jun
    Cho, Min Su
    Yu, Eunseon
    Lee, Jung-Hee
    Cho, Seongjae
    Kang, In Man
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2018, 18 (09) : 6593 - 6597
  • [32] Pinch-off effect in p-type double gate and single gate junctionless silicon nanowire transistor fabricated by Atomic Force Microscopy Nanolithography
    Larki, Farhad
    Dehzangi, Arash
    Hassan, Jumiah
    Abedini, Alam
    Saion, E. B.
    Hutagalung, Sabar D.
    Abdullah, A. Makarimi
    Hamidon, M. N.
    NANO HYBRIDS, 2013, 4 : 33 - 45
  • [33] Pinch-off effect in p-type double gate and single gate junctionless silicon nanowire transistor fabricated by Atomic Force Microscopy Nanolithography
    Larki, Farhad
    Dehzangi, Arash
    Hassan, Jumiah
    Abedini, Alam
    Saion, E. B.
    Hutagalung, Sabar D.
    Abdullah, A. Makarimi
    Hamidon, M. N.
    NANO HYBRIDS AND COMPOSITES, 2013, 4 : 33 - 45
  • [34] Performance Enhancement of Asymmetrical Double Gate Junctionless CMOS Inverter With 3-nm Critical Feature Size Using Charge Sheet
    Bavir, Mohammad
    Abbasi, Abdollah
    Orouji, Ali Asghar
    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2022, 10 : 334 - 340
  • [35] Investigation of the Noise Performance of Double-Gate MOSFETs by Deterministic Simulation of the Boltzmann Equation
    Hong, Sung-Min
    Jungemann, Christoph
    2009 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES, 2009, : 103 - 106
  • [36] Effect of Channel Thickness on Performance of Ultra-Thin Body IGZO Field-Effect Transistors
    Kim, Min Jae
    Park, Hyeong Jin
    Yoo, Sungwon
    Cho, Min Hee
    Jeong, Jae Kyeong
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 69 (05) : 2409 - 2416
  • [37] Performance Evaluation of a Gate All Around Junctionless Field Effect Transistor Based Biosensor with a Nano-Cavity Region
    Al Rahman, Mahsab
    Hossain, Ehteshum
    Siddiqui, Farhana
    2020 23RD INTERNATIONAL CONFERENCE ON COMPUTER AND INFORMATION TECHNOLOGY (ICCIT 2020), 2020,
  • [38] A two dimensional analytical model study of the performance of junctionless trial-material cylindrical surrounding-gate MOSFET
    Fairouz, Lagraf
    Djamil, Rechem
    Kamel, Guergouri
    Aicha, Khial
    2016 39TH INTERNATIONAL SEMICONDUCTOR CONFERENCE (CAS), 2016, : 195 - 198
  • [39] Performance Enhancement in Multi Gate Tunneling Field Effect Transistors by Scaling the Fin-Width
    Leonelli, Daniele
    Vandooren, Anne
    Rooyackers, Rita
    Verhulst, Anne S.
    De Gendt, Stefan
    Heyns, Marc M.
    Groeseneken, Guido
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (04)
  • [40] Simulation study of circuit performances of independent double-gate (IDG) MOSFETs with high-permittivity gate dielectrics
    Loussier, X.
    Munteanu, D.
    Autran, J. L.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2009, 355 (18-21) : 1185 - 1188