A Simulation Study of Thickness Effect in Performance of Double Lateral Gate Junctionless Transistors

被引:0
|
作者
Larki, Farhad [1 ]
Dehzangi, Arash [1 ]
Hamidon, M. N. [2 ]
Ali, Sawal Hamid Md [1 ]
Jalar, Azman [1 ]
Islam, Md. Shabiul [1 ]
机构
[1] Univ Kebangsaan Malaysia, Inst Microengn & Nanoelect IMEN, Bangi 43600, Selangor, Malaysia
[2] Univ Putra Malaysia, Inst Adv Technol, Funct Devices Lav, Serdang 43400, Malaysia
来源
2013 IEEE REGIONAL SYMPOSIUM ON MICRO AND NANOELECTRONICS (RSM 2013) | 2013年
关键词
Junctionless transistor; lateral gate; thickness effect; TCAD simulation; SILICON;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical behaviour of double lateral gate junctionless transistors, regarding to the variation of channel thickness is investigated, through 3-D numerical simulations. The simulation results explicitly show that how the device thickness affect the on and off current and threshold voltage behavior based on variation of the carriers density and recombination rates of the carriers. As the channel thickness is decreased, the amount of bulk neutral channel getting smaller which cause a decrease in the on state current. Meanwhile, the lateral gate influence on the channel is reinforced, which cause a decrease in leakage current in the off state. Threshold voltage is decreased as the channel thickness decreases. However, the recombination rate of carriers increases with decreasing the channel thickness, due to the accumulation of minority carries and shifted to the source side of the channel.
引用
收藏
页码:89 / 92
页数:4
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