Adhesion mechanisms of silica layers on plasma-treated polymers .1. Polycarbonate

被引:43
作者
Vallon, S
Hofrichter, A
Guyot, L
Drevillon, B
KlembergSapieha, JE
Martinu, L
PoncinEpaillard, F
机构
[1] ECOLE POLYTECH,PHYS INTERFACES & COUCHES MINCES LAB,UPR 258 CNRS,F-91128 PALAISEAU,FRANCE
[2] ECOLE POLYTECH,DEPT ENGN PHYS,STN CTR VILLE,MONTREAL,PQ H3C 3A7,CANADA
[3] UNIV MAINE,LAB CHIM & PHYSICOCHIM MACROMOL,URA 509 CNRS,F-72017 LE MANS,FRANCE
基金
加拿大自然科学与工程研究理事会;
关键词
adhesion; plasma treatment; polycarbonate; silica; ellipsometry;
D O I
10.1163/156856196X00256
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
We have studied the influence of plasma treatment in various gases (Ar, NH3, N-2) on the surface modification of polycarbonate (PC) and on the adhesion of plasma-deposited silica layers to PC. Surface modification was investigated using in situ IR ellipsometry, X-ray photoelectron spectroscopy, and contact angle measurements interpreted in terms of electron-acceptor/donor groups. In addition, in situ UV-visible ellipsometry enabled crosslinking analysis. Due to UV photon emission, Ar plasma treatment induced crosslinking as well as photo-Fries rearrangements and related reactions, thus creating phenolic groups. These groups are acidic sites and are likely to react with the electronegative oxygen atoms of silica. Adhesion of silica to PC, as measured by the micro-scratch test, was enhanced by Ar plasma treatment. The improvement is attributed to the crosslinking of PC, on the one hand, and to acid-base interactions and/or covalent bonding between PC and silica, on the other hand. A further improvement in adhesion was achieved using N-2 plasma treatments (pure or Ar-diluted). These treatments also induced crosslinking and phenolic group formation and, in addition, nitrogen grafting at the surface. Adhesion enhancement from Ar to N-2 treatments is thus attributed to nitrogen-containing groups, which are likely to promote covalent bonding between silica and the treated polymer surface. In contrast, Ar-diluted NH3 plasma treatment following Ar treatment resulted in decreased adhesion, which is attributed to reduced acidity and low nitrogen grafting.
引用
收藏
页码:1287 / 1311
页数:25
相关论文
共 33 条
[11]   PHASE-MODULATED ELLIPSOMETRY FROM THE ULTRAVIOLET TO THE INFRARED - IN-SITU APPLICATION TO THE GROWTH OF SEMICONDUCTORS [J].
DREVILLON, B .
PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS, 1993, 27 (01) :1-87
[12]   DUAL-MODE RADIO-FREQUENCY MICROWAVE PLASMA DEPOSITION OF AMORPHOUS-SILICON OXIDE THIN-FILMS [J].
ETEMADI, R ;
GODET, C ;
KILDEMO, M ;
BOUREE, JE ;
BRENOT, R ;
DREVILLON, B .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 187 :70-74
[13]  
Fox D. W., 1982, KIRKOTHMER ENCY CHEM, V18, P479
[14]  
Gerenser L. J., 1987, J ADHES SCI TECHNOL, V1, P303, DOI DOI 10.1163/156856187X00319
[15]   CONTACT-ANGLE, WETTING, AND ADHESION - A CRITICAL-REVIEW [J].
GOOD, RJ .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1992, 6 (12) :1269-1302
[16]  
Hudis M., 1974, Techniques and applications of plasma chemistry, P113
[17]   TREATMENT OF POLY(ETHER ETHER KETONE) (PEEK) SURFACES BY REMOTE PLASMA DISCHARGE - XPS INVESTIGATION OF THE AGING OF PLASMA-TREATED PEEK [J].
JAMA, C ;
DESSAUX, O ;
GOUDMAND, P ;
GENGEMBRE, L ;
GRIMBLOT, J .
SURFACE AND INTERFACE ANALYSIS, 1992, 18 (11) :751-756
[18]   DUAL-FREQUENCY N-2 AND NH-3 PLASMA MODIFICATION OF POLYETHYLENE AND POLYIMIDE [J].
KLEMBERGSAPIEHA, JE ;
KUTTEL, OM ;
MARTINU, L ;
WERTHEIMER, MR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06) :2975-2981
[19]  
Lin-Vien D., 1991, The Handbook of Infrared and Raman Characteristic Frequencies of Organic Molecules
[20]   PLASMA SURFACE MODIFICATION OF POLYMERS FOR IMPROVED ADHESION - A CRITICAL-REVIEW [J].
LISTON, EM ;
MARTINU, L ;
WERTHEIMER, MR .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1993, 7 (10) :1091-1127