An investigation of material removal in polishing with fixed abrasives

被引:74
作者
Zhang, L [1 ]
Tam, HY
Yuan, CM
Chen, YP
Zhou, ZD
机构
[1] Tsinghua Univ, Dept Precis Instruments & Mechanol, Mfg Engn Inst, Beijing 100084, Peoples R China
[2] City Univ Hong Kong, Dept Mfg Engn & Engn Management, Kowloon, Hong Kong, Peoples R China
[3] Huazhong Univ Sci & Technol, Sch Mech Sci & Engn, Wuhan 430074, Peoples R China
关键词
material removal; elliptical Hertzian contact; abrasive wear; polishing;
D O I
10.1243/0954405021519591
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper investigates the removal of material from a surface during polishing with fixed abrasives. The material removal profile prescribes the amount of material removed from the surface along a direction orthogonal to the tool path as a polishing tool is moved along the surface. It depends on the geometry and mechanical properties of the tool and the surface as well as on the polishing condition. A wear index for polishing is introduced to relate the material removal to the polishing condition. On the basis of the wear index, an approach for calculating the material removal profile is developed. It assumes that the pressure distribution is Hertzian at the contact between the tool and the surface. Polishing experiments are conducted which consist of polishing convex surfaces with cylindrical tools and concave surfaces with spherical tools. The proposed approach has been confirmed by measurements of material removal profiles in these experiments.
引用
收藏
页码:103 / 112
页数:10
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