Metalorganic chemical vapor deposition of BaTiO3 thin film and its physical properties

被引：0

作者：

Wang, H ^{[1
]}

Zeng, JM ^{[1
]}

Wang, Z ^{[1
]}

Wang, M ^{[1
]}

Shang, SX ^{[1
]}

机构：

[1] SHANDONG UNIV,INST CRYSTAL MAT,JINAN 250100,PEOPLES R CHINA

来源：

PHOTOREFRACTIVE MATERIALS | 1996年 / 2896卷

关键词：

BaTiO3; thin film; ferroelectrics; MOCVD;

D O I：

10.1117/12.253243

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：264 / 266

页数：3

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