Modeling of Channel Potential and Subthreshold Slope of Symmetric Double-Gate Transistor

被引:46
作者
Ray, Biswajit [1 ]
Mahapatra, Santanu [1 ]
机构
[1] Indian Inst Sci, Ctr Elect Design & Technol, Nano Scale Device Res Lab, Bangalore 560012, Karnataka, India
关键词
Compact model; device stimulator; double-gate (DG); Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET); Poisson's equation; short-channel effect (SCE); subthreshold slope;
D O I
10.1109/TED.2008.2010577
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new physically based classical continuous potential distribution model, particularly considering the channel center, is proposed for a short-channel undoped body symmetrical double-gate transistor. It involves a novel technique for solving the 2-D nonlinear Poisson's equation in a rectangular coordinate system, which makes the model valid from weak to strong inversion regimes and from the channel center to the surface. We demonstrated, using the proposed model, that the channel potential versus gate voltage characteristics for the devices having equal channel lengths but different thicknesses pass through a single common point (termed "crossover point"). Based on the potential model, a new compact model for the subthreshold swing is formulated. It is shown that for the devices having very high short-channel effects (SCE), the effective subthreshold slope factor is mainly dictated by the potential close to the channel center rather than the surface. SCEs and drain-induced barrier lowering are also assessed using the proposed model and validated against a professional numerical device simulator.
引用
收藏
页码:260 / 266
页数:7
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