Nanostructuring with spatially localized femtosecond laser pulses

被引：111
作者：
Nolte, S
Chichkov, BN
Welling, H
Shani, Y
Lieberman, K
Terkel, H
机构：
[1] Laser Zentrum Hannover EV, D-30419 Hannover, Germany
[2] Nanon Lithog Ltd, IL-91487 Jerusalem, Israel
来源：
OPTICS LETTERS | 1999年 / 24卷 / 13期
关键词：
D O I：
10.1364/OL.24.000914
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Spatially localized femtosecond pulses have been produced by a combination of scanning near-field optical microscopy with ultrashort pulse lasers. With these pulses direct ablative writing on metal surfaces is demonstrated. Possible applications of this technique for nanostructuring, repair, and production of lithographic masks are discussed. (C) 1999 Optical Society of America OCIS codes: 140.7090, 180.5810, 220.4000.
引用
收藏
页码：914 / 916
页数：3
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