Influence of oxygen plasma treatment on properties of ZrO2 films prepared by e-beam evaporation techniques

被引：6

作者：

Zhang, Dongping ^{[1
]}

Fan, Ping ^{[1
]}

Cai, Xing-Min ^{[1
]}

Liang, Guangxing ^{[1
]}

Shao, Jianda ^{[2
]}

Wang, Congjuan ^{[2
]}

Zhang, Dawei ^{[2
]}

Fan, Zhengxiu ^{[2
]}

机构：

[1] Shenzhen Univ, Coll Phys, Shenzhen 518060, Peoples R China

[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China

来源：

SOLID STATE COMMUNICATIONS | 2008年 / 148卷 / 1-2期

基金：

中国国家自然科学基金;

关键词：

thin film; plasma treatment; microstructure; optical property;

D O I：

10.1016/j.ssc.2008.07.019

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Zirconia films were prepared by e-beam evaporation, and oxygen plasma treatment was used to modify film properties. Spectrophotometry, x-ray diffractometry (XRD), and atomic force microscopy were used to characterize refractive index, extinction coefficient, rnicrostructure, and surface roughness, respectively. The experimental results indicate that both refractive index and extinction coefficient of the films were reduced slightly after oxygen plasma treatment, with the decrease of intrinsic stress and surface roughness. From XRD spectra, the intensity decrease of the T(110) diffraction peak was clearly observed after the treatment, which was caused by the restructuring of the film atoms. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：22 / 24

页数：3

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