Direct imprinting using soft mold and gas pressure for large area and curved surfaces

被引：45

作者：

Chang, JH

Cheng, FS

Chao, CC

Weng, YC

Yang, SY ^{[1
]}

Wang, LA

机构：

[1] Natl Taiwan Univ, Dept Mech Engn, Grace Lab Polymer Proc, Taipei 106, Taiwan

[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 106, Taiwan

[3] Natl Taiwan Univ, Inst Electroopt Engn, Taipei 106, Taiwan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2005年 / 23卷 / 06期

关键词：

D O I：

10.1116/1.2073447

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this paper we report a simple and effective method that renders direct imprinting of sub-micron structures onto PMMA resist coated on large area and curved substrates using the PDMS mold on a closed chamber. Nitrogen gas was employed to generate a uniform pressure. The patterns of the soft mold could be replicated with high quality over an entire 12, in. resist-coated area. The process was further successfully applied to the imprinting of a curved substrate. (c) 2005 American Vacuum Society.

引用

页码：1687 / 1690

页数：4

共 14 条

[1] Step and flash imprint lithography: Defect analysis [J].

Bailey, T ;

Smith, B ;

Choi, BJ ;

Colburn, M ;

Meissl, M ;

Sreenivasan, SV ;

Ekerdt, JG ;

Willson, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2806-2810

[2] Step and flash imprint lithography: Template surface treatment and defect analysis [J].

Bailey, T ;

Choi, BJ ;

Colburn, M ;

Meissl, M ;

Shaya, S ;

Ekerdt, JG ;

Sreenivasan, SV ;

Willson, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3572-3577

[3]

Chang JH, 2003, MICROSYST TECHNOL, V10, P76, DOI [10.1007/s00542-003-0311-1, 10.1007/S00542-003-0311-1]

[4] The fabrication of submicron patterns on curved substrates using a polydimethylsiloxane film mould [J].

Choi, WM ;

Park, OO .

NANOTECHNOLOGY, 2004, 15 (12) :1767-1770

[5] Sub-10 nm imprint lithography and applications [J].

Chou, SY ;

Krauss, PR ;

Zhang, W ;

Guo, LJ ;

Zhuang, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2897-2904

[6] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS [J].

CHOU, SY ;

KRAUSS, PR ;

RENSTROM, PJ .

APPLIED PHYSICS LETTERS, 1995, 67 (21) :3114-3116

[7] Uniformity across 200 mm silicon wafers printed by nanoimprint lithography [J].

Gourgon, C ;

Perret, C ;

Tallal, J ;

Lazzarino, F ;

Landis, S ;

Joubert, O ;

Pelzer, R .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2005, 38 (01) :70-73

[8] Patterning spherical surfaces at the two-hundred-nanometer scale using soft lithography [J].

Paul, KE ;

Prentiss, M ;

Whitesides, GM .

ADVANCED FUNCTIONAL MATERIALS, 2003, 13 (04) :259-263

[9] Wafer scale patterning by soft UV-nanoimprint lithography [J].

Plachetka, U ;

Bender, M ;

Fuchs, A ;

Vratzov, B ;

Glinsner, T ;

Lindner, F ;

Kurz, H .

MICROELECTRONIC ENGINEERING, 2004, 73-4 :167-171

[10] Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography [J].

Ruchhoeft, P ;

Colburn, M ;

Choi, B ;

Nounu, H ;

Johnson, S ;

Bailey, T ;

Damle, S ;

Stewart, M ;

Ekerdt, J ;

Sreenivasan, SV ;

Wolfe, JC ;

Willson, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06) :2965-2969

← 1 2 →