Direct imprinting using soft mold and gas pressure for large area and curved surfaces

被引：45
作者：
Chang, JH
Cheng, FS
Chao, CC
Weng, YC
Yang, SY [1 ]
Wang, LA
机构：
[1] Natl Taiwan Univ, Dept Mech Engn, Grace Lab Polymer Proc, Taipei 106, Taiwan
[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 106, Taiwan
[3] Natl Taiwan Univ, Inst Electroopt Engn, Taipei 106, Taiwan
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2005年 / 23卷 / 06期
关键词：
D O I：
10.1116/1.2073447
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this paper we report a simple and effective method that renders direct imprinting of sub-micron structures onto PMMA resist coated on large area and curved substrates using the PDMS mold on a closed chamber. Nitrogen gas was employed to generate a uniform pressure. The patterns of the soft mold could be replicated with high quality over an entire 12, in. resist-coated area. The process was further successfully applied to the imprinting of a curved substrate. (c) 2005 American Vacuum Society.
引用
收藏
页码：1687 / 1690
页数：4
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