Controlled modification of octadecyltrichlorosilane self-assembled monolayer by CO2 plasma

被引:21
作者
Delorme, N
Bardeau, JF
Bulou, A
Poncin-Epaillard, F
机构
[1] Univ Maine, CNRS, Lab Phys Etat Condense, UMR 6087, F-72085 Le Mans 9, France
[2] Univ Maine, CNRS, UMR 6120, F-72085 Le Mans 9, France
[3] Univ Maine, CNRS, Inst Rech Ingn Mol & Mat Fonct, FR 2575, F-72085 Le Mans 9, France
关键词
plasma processing; octadecyltrichlorosilane; atomic force microscopy; X-ray photoelectron spectroscopy;
D O I
10.1016/j.tsf.2005.09.105
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CO2-plasma is used to introduce functional groups on the uppermost surface of an alkoxysilane self-assembled monolayer (SAM). The structural and chemical modifications of the material surface were monitored by X-ray reflectometry, atomic force microscopy, X-ray photoelectrons spectroscopy and water contact angle measurements. Optimization of the plasma parameters is performed in order to achieve a maximum functionalization and to prevent degradation of the SAM. Finally, the ability of grafting organic compounds onto the plasma modified SAMS was demonstrated by the formation of an alkoxysilane bilayer. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:612 / 618
页数:7
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