Silicon-mediated alleviation of Cadmium toxicity on Thujopsis dolabrata

被引:0
|
作者
Huang, Y. C. [1 ]
Chen, H. [1 ]
Zhao, W. J. [2 ]
Li, W. D. [1 ]
Yang, H. Y. [1 ]
Sun, Y. [1 ]
Wang, L. [1 ]
Cao, S. H. [1 ]
机构
[1] Hangzhou Normal Univ, Qianjiang Coll, Polytech Inst, Hangzhou 310036, Zhejiang, Peoples R China
[2] Hangzhou Nengda Huawei Equipment Co Ltd, Hangzhou 310020, Zhejiang, Peoples R China
基金
中国国家自然科学基金;
关键词
Cadmium; Rhizosphere; Root exudation; Silicon; Thujopsis dolabrata; ALUMINUM-RESISTANCE; RHIZOSPHERE; CD; ACCUMULATION; ENHANCEMENT; MECHANISMS; TOLERANCE; RESPONSES; GROWTH; WHEAT;
D O I
暂无
中图分类号
Q94 [植物学];
学科分类号
071001 ;
摘要
We conducted pot experiments on the cypress Thujopsis dolabrata (Linn. f.) Sieb. et Zucc. in order to study the interaction of silicon (Si) and root exudates on cadmium (Cd) bioavailability in the rhizosphere,. Each variety was planted with 100 mg/kg Cd and/or 400 mg/kg Si for 210 days. The results showed that adding Si increased Cd tolerance in T. dolabrata, but that the mechanism was specifical. In T. dolabrata, Si did not prevent Cd translocation from roots to shoots, and it significantly enhanced Cd accumulation without inhibiting growth. Moreover, Si mobilized Cd from the rhizospheric soil by stimulating phenolic exudation from the roots, suggesting that Cd-chelation combined with Si-induced phenolics were involved in Cd detoxification.
引用
收藏
页码:283 / 290
页数:8
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