Design and fabrication of a high transmissivity metal-dielectric ultraviolet band-pass filter

被引：22

作者：

Mu, Jianwei ^{[1
,2
]}

Lin, Pao-Tai ^{[1
,2
]}

Zhang, Lin ^{[1
,2
]}

Michel, Jurgen ^{[1
,2
]}

Kimerling, L. C. ^{[1
,2
]}

Jaworski, Frank ^{[3
]}

Agarwal, Anu ^{[1
,2
]}

机构：

[1] MIT, Microphoton Ctr, Cambridge, MA 02139 USA

[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[3] Raytheon Vis Syst, Goleta, CA 93117 USA

来源：

APPLIED PHYSICS LETTERS | 2013年 / 102卷 / 21期

基金：

加拿大自然科学与工程研究理事会;

关键词：

OPTICAL-PROPERTIES; DETECTORS;

D O I：

10.1063/1.4807925

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We introduce an efficient design approach for Ultraviolet (iUV) band-pass filter based on metal-dielectric stacks. We present a general design method and then apply this design to two special cases: a UV band pass filter based on (ii) Al/Al2O3 stacks as well as (iii) Ag/SiO2 stacks. As an experimental confirmation, we fabricate a UV filter with three Ag/SiO2 layer pairs on a fused silica substrate (iCorning 7980), targeting a central wavelength of 320 nm. A measurement at the peak wavelength shows transmission efficiency as high as 67% in our filter. (C) 2013 AIP Publishing LLC.

引用

页数：3

共 8 条

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