Design and optimization of single, double and multilayer anti-reflection coatings on planar and textured surface of silicon solar cells

被引:21
作者
Valiei, Maryam [1 ]
Shaibani, Parman Mojir [2 ]
Abdizadeh, Hossein [2 ]
Kolahdouz, Mohammadreza [1 ]
Soleimani, Ebrahim Asl [1 ]
Poursafar, Jafar [1 ]
机构
[1] Univ Tehran, Coll Engn, Sch Elect & Comp Engn, Tehran, Iran
[2] Univ Tehran, Fac Met & Mat Engn, Coll Engn, Tehran, Iran
关键词
Antireflection coatings design; Multilayer coatings; Reflection reduction; FDTD method; Electrical and optical properties; Silicon solar cell; SIOXNY THIN-FILMS; RECOMBINATION VELOCITY; PASSIVATION; EFFICIENCY; NITRIDE; SI; ENHANCEMENT;
D O I
10.1016/j.mtcomm.2022.104144
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The present silicon solar cell industry's main concern is to increase efficiency by minimizing the surface reflection. As a result, lately, much attention has been paid to the composition and number of the layers used for anti-reflection coatings in order to reduce surface reflection. In the present work, single, double, triple, and quadruple anti-reflection coatings on silicon solar cells have been designed and optimized using FDTD and PC1D simulation methods. The different combinations of SiO2, SiON, Si3N4, and SiNx coatings on both planar and textured surfaces were simulated and their optical and electrical parameters were investigated. Compared to planar surfaces, the designed coatings on textured surfaces showed better optical and electrical results for almost all investigated parameters. On textured surfaces, SiO2/Si3N4/SiNx acquired the lowest weighted average reflection (0.121%), SiO2/SiNx, SiON/SiNx, SiO2/Si3N4/SiNx, and SiO2/SiON/Si3N4/SiNx the highest Jsc(38.5 mA/cm(2)) and finally SiO2/Si3N4/SiNx and SiO2/SiON/Si3N4/SiNx both the highest V-oc(705.7 mV) and eta(23%).
引用
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页数:10
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