Enhanced refractive index sensitivity of elevated short-range ordered nanohole arrays in optically thin plasmonic Au films

被引：58

作者：

Bochenkov, Vladimir E. ^{[1
,2
]}

Frederiksen, Maj ^{[1
]}

Sutherland, Duncan S. ^{[1
]}

机构：

[1] Aarhus Univ, Interdisciplinary Nanosci Ctr iNANO, Aarhus, Denmark

[2] Moscow MV Lomonosov State Univ, Dept Chem, Moscow, Russia

来源：

OPTICS EXPRESS | 2013年 / 21卷 / 12期

关键词：

COLLOIDAL LITHOGRAPHY; SENSORS; RESONANCES; LIMIT;

D O I：

10.1364/OE.21.014763

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A simple development of the colloidal lithography technique is demonstrated for fabrication of perforated plasmonic metal films elevated above the substrate surface. The bulk refractive index sensitivity of short-range ordered nanohole arrays in 20 nm thick Au films exhibits an increase of up to 37% due to reduction of substrate effect caused by lifting with a 40 nm silica layer. Analysis of the local electric field distribution suggests that the sensitivity increase is due to revealing of the enhanced field near the holes. (C) 2013 Optical Society of America

引用

页码：14763 / 14770

页数：8

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