Study of iridium silicide monolayers using density functional theory

被引:1
作者
Popis, Minh D. [1 ]
Popis, Sylvester V. [1 ]
Oncel, Nuri [2 ]
Hoffmann, Mark R. [1 ]
Cakir, Deniz [2 ]
机构
[1] Univ North Dakota, Dept Chem, Grand Forks, ND 58202 USA
[2] Univ North Dakota, Dept Phys & Astrophys, Grand Forks, ND 58202 USA
关键词
ELECTRONIC-PROPERTIES; SILICENE; GERMANENE; MOBILITY; RISE;
D O I
10.1063/1.5010331
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, we investigated physical and electronic properties of possible two-dimensional structures formed by Si (silicon) and Ir (iridium). To this end, different plausible structures were modeled by using density functional theory and the cohesive energies calculated for the geometry of optimized structures, with the lowest equilibrium lattice constants. Among several candidate structures, we identified three mechanically (via elastic constants and Young's modulus), dynamically (via phonon calculations), and thermodynamically stable iridium silicide monolayer structures. The lowest energy structure has a chemical formula of Ir2Si4 (called r-IrSi2), with a rectangular lattice (Pmmn space group). Its cohesive energy was calculated to be 0.248 eV (per IrSi2 unit) with respect to bulk Ir and bulk Si. The band structure indicates that the Ir2Si4 monolayer exhibits metallic properties. Other stable structures have hexagonal (P-3m1) and tetragonal (P4/nmm) cell structures with 0.12 and 0.20 eV/f.u. higher cohesive energies, respectively. Our calculations showed that Ir-Si monolayers are reactive. Although O-2 molecules exothermically dissociate on the surface of the free-standing iridium silicide monolayers with large binding energies, H2O molecules bind to the monolayers with a rather weak interaction. Published by AIP Publishing.
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页数:9
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