Low noise and high gain RF MOSFETs on plastic substrates

被引:2
作者
Kao, HL [1 ]
Chin, A [1 ]
Huang, CC [1 ]
Hung, BF [1 ]
Chiang, KC [1 ]
Lai, ZM [1 ]
McAlister, SP [1 ]
Chi, CC [1 ]
机构
[1] Natl Chiao Tung Univ, Univ Syst Taiwan, Dept Elect Engn, Nano Sci Tech Ctr, Hsinchu, Taiwan
来源
2005 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM, VOLS 1-4 | 2005年
关键词
RF noise; associated gain; MOSFET; plastic;
D O I
10.1109/MWSYM.2005.1516584
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A low minimum noise figure (NFmin) of 1.2 dB and high associated gain of 12.8 dB at 10 GHz, were measured for 0.18 mu m RF MOSFETs on plastic, made by substrate thinning (similar to 30 mu m), transfer and bonding. The performance can be further improved to 0.96 dB NFmin and 14.1 dB associated gain at 10 GHz, under applied tensile strain, using flexible Si on plastic. A 3.5 nH inductor on plastic showed a 55% higher Q-factor with a wider frequency range, compared with that on a Si substrate.
引用
收藏
页码:295 / 298
页数:4
相关论文
共 15 条
[1]  
Belford R. E., 2002, Device Research Conference (Cat. No.02TH8606), P41, DOI 10.1109/DRC.2002.1029496
[2]  
BLONDY P, 1998, IEEE MTT S INT MICR, P1181
[3]   Low RF loss and noise of transmission lines on Si substrates using an improved ion implantation process [J].
Chan, KT ;
Chin, A ;
McAlister, SP ;
Chang, CY ;
Tseng, C ;
Liang, V ;
Chen, JK ;
Chien, SC ;
Duh, DS ;
Lin, WJ .
2003 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-3, 2003, :963-966
[4]  
Chan KT, 2001, IEEE MTT S INT MICR, P763, DOI 10.1109/MWSYM.2001.967004
[5]  
CHAN KT, 2001, IEDM, P903
[6]  
Chin A, 2003, 2003 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST, P375
[7]  
Dekker R, 2003, 2003 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST, P371
[8]   Modeling finger number dependence on RF noise to 10 GHz in 0.13μm node MOSFETs with 80nm gate length [J].
King, MC ;
Lai, ZM ;
Huang, CH ;
Lee, CF ;
Ma, MW ;
Huang, CM ;
Chang, Y ;
Chin, A .
2004 IEEE RADIO FREQUENCY INTEGRATED CIRCUITS (RFIC) SYMPOSIUM, DIGEST OF PAPERS, 2004, :171-174
[9]  
KING MC, 2004, IEEE MTT S INT MICR, V1, P6
[10]   Improvement of high resistivity substrate for future mixed analog-digital applications [J].
Ohguro, T ;
Kojima, K ;
Momose, HS ;
Nitta, S ;
Fukuda, T ;
Enda, T ;
Toyoshima, Y .
2002 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, 2002, :158-159