Direct observation of the band gap shrinkage in amorphous In2O3-ZnO thin films

被引:25
作者
Jia, Junjun [1 ]
Oka, Nobuto [1 ]
Shigesato, Yuzo [1 ]
机构
[1] Aoyama Gakuin Univ, Grad Sch Sci & Engn, Chuo Ku, Sagamihara, Kanagawa 2525258, Japan
关键词
X-RAY PHOTOEMISSION; ZINC-OXIDE FILMS; SN-DOPED IN2O3; PHOTOELECTRON-SPECTROSCOPY; OPTICAL-PROPERTIES; ZNO; SEMICONDUCTORS; ENERGY; SPECTRA;
D O I
10.1063/1.4802441
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigated the dependence of valence-and core-level photoemission spectra of amorphous In2O3-ZnO (a-IZO) films on carrier density by using hard x-ray photoemission spectroscopy (h nu = 8000 eV). The valence band edge distinctly shifts toward high binding energy with the increase in carrier density from 0.80 to 3.96 x 10(20) cm(-3), and an abrupt jump for the shift of the valence band edge from high to low binding energy occurs at a carrier density of 4.76 x 10(20) cm(-3). After considering the effect of nonparabolic bandstructure, the shifts are still less than the width of the occupied conduction band, providing direct evidence for the band gap shrinkage. Our calculation results indicate that the contribution of the band gap shrinkage increases as the carrier density increases, which accords with the observations in doped conducting crystal materials, such as Sn doped In2O3. Moreover, it is found that the conduction electrons of a-IZO films are strongly perturbed by the ionization of core levels, which leads to obvious plasmon satellites in core photoemission spectra lines. (C) 2013 AIP Publishing LLC
引用
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页数:7
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