Effect of deposition atmosphere on the structure and properties of Mg doped CuCrO2 thin films prepared by direct current magnetron sputtering

被引：15

作者：

Wu, Suzhen ^{[1
]}

Deng, Zanhong ^{[1
,2
]}

Dong, Weiwei ^{[1
,2
]}

Shao, Jingzhen ^{[1
,2
]}

Fang, Xiaodong ^{[1
,2
]}

机构：

[1] Acad Sinica, Anhui Inst Opt & Fine Mech, Anhui Prov Key Lab Photon Devices & Mat, Hefei 230031, Peoples R China

[2] Chinese Acad Sci, Key Lab Novel Thin Film Solar Cells, Hefei 230031, Peoples R China

来源：

THIN SOLID FILMS | 2015年 / 595卷

关键词：

Delafossite; CuCrO2; Thin films; Sputtering; Transparent conducting oxide; CONDUCTIVITY; TRANSPORT;

D O I：

10.1016/j.tsf.2015.10.061

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

CuCr0.97Mg0.03O2 thin films were prepared by direct current magnetron sputtering under various percentage of oxygen flow rate (PO) followed by post-annealed in N-2 atmosphere. The microstructures, optical and electrical properties of the films were investigated. The film deposited in pure Ar atmosphere showed pure CuCrO2 phase, while the films deposited in O-2 and Ar mixture atmosphere showed CuO and CuCr2O4 mixture phase. After post-annealed at 800 degrees C, the films deposited in O-2 and Ar mixture atmosphere turned into c-axis oriented single-phase CuCrO2 which showed much better transparency and electrical conductivity than the film deposited in pure Ar. The film deposited in P-O = 40% with thickness of 350 nm showed the lowest resistivity of 0.4 Omega cm and transmittance over 60% in visible light region. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：124 / 128

页数：5

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