Modeling amorphous silicon nitride: A comparative study of empirical potentials

被引:20
作者
Dasmahapatra, Atreyi [1 ]
Kroll, Peter [1 ]
机构
[1] Univ Texas Arlington, Dept Chem & Biochem, 700 Planetarium Pl, Arlington, TX 76019 USA
关键词
Amorphous material; Silicon nitride; Density functional theory; Empirical potential; Molecular dynamics; Enthalpy of formation; MOLECULAR-DYNAMICS SIMULATION; SI3N4; NANOINDENTATION; CHEMISTRY; CERAMICS; ENERGY;
D O I
10.1016/j.commatsci.2017.12.008
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We perform a comparative study of empirical potentials for atomistic simulations of amorphous silicon nitride (a-Si3N4). We choose 5 different parameterizations of the Tersoff potential, the Marian-Gastreich two-body (MG2) and three-body (MG3) potential, the Vashishta (V) potential, and the Garofalini (SG) potential. Amorphous models of Si3N4, comprising of 448 atoms, are generated by each empirical potential using a melt-and-quench procedure. Subsequently, models are optimized using Density Functional Theory calculations, and structures resulting from these DFT optimizations are compared. We emphasize local coordination of atoms and the enthalpies of formation (Delta H-f) relative to crystalline beta-Si3N4. The SG and MG2 potentials prove to be best options for modeling of a-Si3N4. Models generated with these potentials are close to their DFT local minimum, exhibit the smallest number of defects, and have realistic enthalpies of formation. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:165 / 175
页数:11
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