Vapor-liquid-solid growth of serrated GaN nanowires: shape selection driven by kinetic frustration

被引:30
作者
Ma, Zheng [1 ]
McDowell, Dillon [1 ]
Panaitescu, Eugen [1 ]
Davydov, Albert V. [2 ]
Upmanyu, Moneesh [3 ,4 ]
Menon, Latika [1 ]
机构
[1] Northeastern Univ, Dept Phys, Boston, MA 02115 USA
[2] Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
[3] Northeastern Univ, Grp Simulat & Theory Atom Scale Mat Phenomen, Dept Mech & Ind Engn, Boston, MA 02115 USA
[4] Northeastern Univ, Dept Bioengn, Boston, MA 02115 USA
基金
美国国家科学基金会;
关键词
SURFACE; MECHANISM; NANOSTRUCTURES; NUCLEATION; DEPOSITION; RATIO;
D O I
10.1039/c3tc31776e
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Compound semiconducting nanowires are promising building blocks for several nanoelectronic devices yet the inability to reliably control their growth morphology is a major challenge. Here, we report the Au-catalyzed vapor-liquid-solid (VLS) growth of GaN nanowires with controlled growth direction, surface polarity and surface roughness. We develop a theoretical model that relates the growth form to the kinetic frustration induced by variations in the V(N)/III(Ga) ratio across the growing nanowire front. The model predictions are validated by the trends in the as-grown morphologies induced by systematic variations in the catalyst particle size and processing conditions. The principles of shape selection highlighted by our study pave the way for morphological control of technologically relevant compound semiconductor nanowires.
引用
收藏
页码:7294 / 7302
页数:9
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