Hydrogen absorption in palladium films sensed by changes in their resistivity

被引：57
作者：
Cabrera, AL
AguayoSoto, R
机构：
来源：
CATALYSIS LETTERS | 1997年 / 45卷 / 1-2期
关键词：
hydrogen absorption; palladium films; hydrogen diffusion; resistance measurements; electron microscopy; electron diffraction; CARBON-MONOXIDE; KINETICS; FOILS; DESORPTION; ADSORPTION; OVERLAYERS; PD(110); ALLOYS; NB; TA;
D O I：
10.1023/A:1019078419537
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The resistance of pure palladium Films of 11, 30 and 54 nm thickness was monitored during their exposure to H-2 at pressures ranging between 1 and 20 Torr. After completing a cycle of H-2 absorption/desorption, the resistivity changed in a ''saw tooth'' fashion similar to the changes observed in surface adsorption of hydrogen by other transition metals. Large resistance changes are observed in these studies, confirming that bulk hydrogen absorption occurs in Pd while hydrogen surface adsorption becomes dominant over bulk absorption in other metals such as niobium. The resistance change curves carry the information of the kinetics of absorption.
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页码：79 / 83
页数：5
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