Characterisation of RF-sputtered platinum films from industrial production plants using slow positrons

被引：8

作者：

Osipowicz, A ^{[1
]}

Härting, M

Hempel, M

Britton, DT

Bauer-Kugelmann, W

Trifthäuser, W

机构：

[1] Fachhsch Fulda, Fak Elektrotech, D-36039 Fulda, Germany

[2] Univ Cape Town, Dept Phys, ZA-7701 Rondebosch, South Africa

[3] Univ Bundeswehr Munchen, Inst Nukl Festkorperphys, D-85577 Neubiberg, Germany

来源：

APPLIED SURFACE SCIENCE | 1999年 / 149卷 / 1-4期

关键词：

Pt thin films; positron lifetime; Doppler-broadening; industrial production;

D O I：

10.1016/S0169-4332(99)00200-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Platinum films, used in thin film technology, produced by radio-frequency sputter deposition on aluminium oxide substrates under different conditions, have been studied by positron beam and other techniques, before and after production annealing. The defect structure in the layers has been characterised using both positron Lifetime and Doppler-broadening spectroscopy, and compared with X-ray studies of crystallinity and texture. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：198 / 203

页数：6

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