Si/C phases from the IR laser-induced decomposition of silacyclobutane and 1,3-disilacyclobutane

被引:0
|
作者
Bastl, Z
Burger, H
Fajgar, R
Pokorna, D
Pola, J
Senzlober, M
Subrt, J
Urbanova, M
机构
[1] UNIV GESAMTHSCH WUPPERTAL, W-5600 WUPPERTAL 1, GERMANY
[2] J HEYROVSKY INST PHYS CHEM & ELECTROCHEM, CR-18223 PRAGUE 8, CZECH REPUBLIC
[3] ACAD SCI CZECH REPUBL, INST CHEM PROC FUNDAMENTALS, CR-16502 PRAGUE 6, CZECH REPUBLIC
[4] INST INORGAN CHEM, CR-25068 PRAGUE, CZECH REPUBLIC
关键词
laser; chemical vapour deposition; thin films; Si/C/H materials; silacyclobutane; 1,3-disilacyclobutane; silicon carbide;
D O I
10.1002/(SICI)1099-0739(199603)10:2<83::AID-AOC483>3.0.CO;2-F
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
CO2 laser-induced infrared multiphoton decomposition (IRMPD) and SF6 photosensitized decomposition (LPD) of silacyclobutane (SCB) and 1,3-disilacyclobutane (DSCB) in the gas phase results in the very efficient deposition of Si/C/H and SiC materials, and it is inferred that the process is dominated by formation of transient silene; silene rearrangement to methylsilylene; silene and methylsilylene dehydrogenation; and polymerization of SICHn (n < 4) species. The deposits are sensitive to oxygen. Decomposition and SIC formation are favoured with IRMPD experiments conducted with high-energy fluxes. The laser technique is promising for low-temperature chemical vapour deposition of amorphous SiC.
引用
收藏
页码:83 / 99
页数:17
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