Enhanced photoelectrochemical properties of hierarchical black TiO2-x nanolaces for Cr (VI) photocatalytic reduction

被引：53

作者：

Chahrour, Khaled M. ^{[1
]}

Yam, F. K. ^{[1
]}

Eid, A. M. ^{[2
]}

Nazeer, Ahmed Abdel ^{[3
]}

机构：

[1] Univ Sains Malaysia, Sch Phys, George Town 11800, Malaysia

[2] Univ Sains Malaysia, Sch Distance Educ, Chem Sect, George Town 11800, Malaysia

[3] Natl Res Ctr, Phys Chem Dept, Electrochem Lab, PO 12622, Giza, Egypt

来源：

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY | 2020年 / 45卷 / 43期

关键词：

Hierarchical TiO2 nanolace; Ti3+ self-doping; Photoelectrochemical properties; Reduction of Cr (VI); VISIBLE-LIGHT; TITANIUM-DIOXIDE; NANOTUBE ARRAYS; HYDROGEN-PRODUCTION; SURFACE MODIFICATION; HEXAVALENT CHROMIUM; THERMAL-TREATMENT; CHARGE-TRANSFER; NANOROD ARRAYS; WATER;

D O I：

10.1016/j.ijhydene.2020.06.078

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this work, hierarchical TiO2 nanolace (NL-TiO2) films have been synthesized by a two-step anodization technique. This was followed by a reduction in a hydrogen atmosphere to prepare the reduced black version of such hierarchical nanolaces (NL-TiO2-x). The FESEM images confirmed highly-ordered nanolace arrays structure for all the synthesized films. The Ti3+ ions/oxygen vacancies were confirmed using XPS spectra. The photo -electrochemical properties of NL-TiO2-x showed superior character in comparison with NL-TiO2 by the virtue of the promoted electron-hole separation efficiency, which induced by the Ti3+ ions/oxygen vacancies in NL-TiO2-x. The data showed that the NL-TiO2-x film annealed at 650 degrees C attained the maximum photoelectrochemical properties with a signif-icant ABPE and IPCE of 0.58% and 52.51%, respectively. The applied photocatalytic reduc-tion of Cr (VI) as an environmental contaminant to Cr (III) was effectively done using NL-TiO2-x and NL-TiO2 annealed at 650 degrees C with a photocatalytic reduction rate 48.15% and 27.5%, respectively. (C) 2020 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.

引用

页码：22674 / 22690

页数：17

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